| 摘要 |
PURPOSE:To be adequately used for irradiation with radiation in the wavelength region of far ultraviolet rays or shorter, and to enhance sensitivity, developability, resolution, and the like by incorporating an acid generator, a cross-linking agent, an alkali-soluble resin, and a specified phenolic compound. CONSTITUTION:This resin composition contains the acid generator to be allowed to generate an acid by irradiation with radiation, the cross-linking agent cross- linking in the presence of an acid, the alkali-soluble resin, and the phenolic compound represented by formula I in which each of R<1>-R<8> is H, 1-C alkyl, or such alkoxy, and A is a simple bond, -S-, -SO2-, -O-or the like. The acid generator is embodied by a compound having an onium salt or haloalkyl group and the like, and it is preferred to add it in an amount of 1-70weight% of the alkali-soluble resin. This composition effectively restrain a resist pattern from swelling and meandering at the time of development. |
