发明名称 SUPPLY OF POLISHING AGENT TO POLISHING DEVICE AND SUPPLY DEVICE THEREOF
摘要 PURPOSE:To supply abrasive grains to a polishing device in a condition where the abrasive grains are dispersed reliably one by one from each other in a supply method of polishing agent to the polishing device. CONSTITUTION:Though polishing agent is supplied to a polishing device 6 from a branch pipe 5 after passing through a main pipe 4 from a central tank, an ultrasonic vibrator 8 is arranged additionally in the branch pipe 5 close to a distributing pan 7 of the polishing device 6, and when this is operated, a specified vibration is applied to the polishing agent passing through the branch pipe 5, and abrasive grains in the polishing agent are separated and dispersed from each other, and are dropped in the distributing pan 7, and are supplied between upper and lower surface plates through an upper surface plate 10 from a distributing pipe 9, so that the abrasive grains in the polishing agent can be supplied while being separated and dispersed from each other.
申请公布号 JPH06106478(A) 申请公布日期 1994.04.19
申请号 JP19920280906 申请日期 1992.09.25
申请人 KYUSHU ELECTRON METAL CO LTD;SUMITOMO SITIX CORP 发明人 SHIRAHAMA SEIJI
分类号 B24B1/04;B24B37/00;B24B57/02;H01L21/304 主分类号 B24B1/04
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