发明名称 Thermic decomposition of toxic gas material in sapphire high temp. furnace - involves sapphire used as walling material for reaction chamber with furnace operating at 1200 to 2000 deg. C
摘要 The basic toxic material (2) is decomposed thermically by flowing through the heated reaction chamber (6) to an end product (8). The composition of the gas mixt. consisting of basic material (2) and end product (8) is determined by spectral analysis during the throughflow. Operating parameters of the reaction chamber in the findings of the spectral analysis are so controlled that a complete decomposition of the basic material occurs. The operating parameters cover the temp. and/or throughflow speed in the reaction chamber (6). The spectral analysis occurs in relation to the throughflow direction at the end of the reaction chamber (6), and at least at two spaced positions along the throughflow direction of the reaction chamber. USE/ADVANTAGE - Appliance for thermic decomposition of toxic gas, which is stable for a long time and controllable.
申请公布号 DE4312144(C1) 申请公布日期 1994.04.14
申请号 DE19934312144 申请日期 1993.04.14
申请人 LINDEMANN, GERHARD, DR., 63454 HANAU, DE;BECKER, ERICH, DIPL.-ING., 64342 SEEHEIM-JUGENHEIM, DE;HEITMANN, WALTER, DR., 64401 GROSS-BIEBERAU, DE 发明人 LINDEMANN, GERHARD, DR., 63454 HANAU, DE;BECKER, ERICH, DIPL.-ING., 64342 SEEHEIM-JUGENHEIM, DE;HEITMANN, WALTER, DR., 64401 GROSS-BIEBERAU, DE
分类号 B01J12/00;B01J19/00;B01J19/08;F23G7/06;F23M5/00;F23M11/04;F27D1/00;F27D17/00;(IPC1-7):F27D1/00 主分类号 B01J12/00
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