| 摘要 |
PURPOSE:To provide a reticle which can suppress deviation of exposure focus between a scribe region and a chip region. CONSTITUTION:A dummy pattern 34 is formed on the center part of the reticle 31 formed with a scribe region pattern 33 at the center area. For example, when a wiring layer is formed by patterning in the chip region of a wafer, a dummy layer having the same thickness as that of the wiring layer is formed on the scribe region of the wafer so as to prevent deviation of exposure focuses between the scribe region and the chip region. |
