发明名称 |
GLASS ETCHING COMPOSITION AND METHOD |
摘要 |
The present invention provides an improved glass etching composition which does not contain any causative materials such as hydrofluoric acid, causing environmental pollution. The etching composition comprises a first solution of a flow modifier and ammonium bifluoride in purified glycerine; and a second solution of ammonium bifluoride and ferric chloride in purified glycerine.
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申请公布号 |
CA2104087(A1) |
申请公布日期 |
1994.02.15 |
申请号 |
CA19932104087 |
申请日期 |
1993.08.13 |
申请人 |
GIMM, SOON H.;KIM, JUNG H. |
发明人 |
GIMM, SOON H.;KIM, JUNG H. |
分类号 |
B44C1/22;C03C15/00;C03C25/68;H01L21/311;(IPC1-7):C03C15/00 |
主分类号 |
B44C1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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