METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE,申请号JP19920149496-传众专利搜索

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发明名称	METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE
摘要
申请公布号	JPH05343380(A)	申请公布日期	1993.12.24
申请号	JP19920149496	申请日期	1992.06.09
申请人	SHARP CORP	发明人	OKI ICHIRO
分类号	H01L21/304;(IPC1-7):H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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