发明名称 ELECTRODEPOSITION BATH CONTAINING A URETHANE
摘要 92/K 034 - ? Electrodeposition bath comprising a urethane An electrodeposition bath comprising a urethane of the formula R1-NHCOO-Rz in which R1 is alkyl or a group of the formula B1-NH-B2-¢X-B3!n-, R2 is a group of the formulae -(C2H4O)y-R1, -(C3H7O)y-R or of the formula , R is C1-C18-alkyl, Y is a number from zero to 4, B1 is hydrogen, alkyl or a group of the formula -COOR2, B2 and B3 may be identical or different and are C2-C14 alkylene, n is an integer from 0 to 5, X is -O-, -S-, -NH- or >N-(C1-C4)alkyl, R3 is hydrogen, alkyl, alkenyl, hydroxyalkyl, phenyl or alkylphenyl, R4 and R5 may be identical or different and are hydrogen or C1-C4-alkyl and A is a direct bond or one of the groups -O-, -CH2O- or -CH2OCO-. - ? The inclusion of these urethanes in the electrodeposition bath brings about a reduction in the number of surface defects on galvanized surfaces.
申请公布号 CA2095575(A1) 申请公布日期 1993.11.12
申请号 CA19932095575 申请日期 1993.05.05
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 WEHNER, SUSANNE;KLIMA, HEINZ;HOENEL, MICHAEL;ZIEGLER, PETER;WALZ, GERD
分类号 C08L63/00;C08G59/28;C09D5/44;C09D175/00;C09D175/04;C25D13/06;(IPC1-7):C25D13/06 主分类号 C08L63/00
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