MANUFACTURE OF EPITAXIAL SEMICONDUCTOR WAFER,申请号JP19920106075-传众专利搜索

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发明名称	MANUFACTURE OF EPITAXIAL SEMICONDUCTOR WAFER
摘要
申请公布号	JPH05283350(A)	申请公布日期	1993.10.29
申请号	JP19920106075	申请日期	1992.03.30
申请人		发明人
分类号	H01L21/02;H01L21/205;H01L21/322;(IPC1-7):H01L21/205	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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