发明名称 COLOR PATTERN FORMING METHOD
摘要 PURPOSE:To obtain RGB color filters which can be produced at a low cost and has the high fineness of the patterns exhibiting the good dyeability by utilizing the silanol groups to be generated by irradiating org. polysilane with UV rays. CONSTITUTION:The method includes pattern coloring stages contg. a stage for forming the latent images of the colored patterns by selectively exposing a polysilane layer 102 which is provided on a substrate 101 and consists of the polysilane having the structure expressed by formula with UV rays 110 and a stage for immersing this polysilane layer 102 into a coloring sol soln. contg. at least one kind of dyes or pigments and consisting of a metal alkoxide as a raw material as well as another pattern coloring stage which is executed at least once in the same manner as for the pattern coloring stages except that the latent images of the differently colored patterns on the polysilane layer 102' and that the different dyes or pigments are used. In the formula, R1 to R2 are aliphat. hydrocarbon residues or alicyclic hydrocarbon residues; m, n are integers.
申请公布号 JPH05273410(A) 申请公布日期 1993.10.22
申请号 JP19920068243 申请日期 1992.03.26
申请人 发明人
分类号 G02B5/20;G02F1/1335 主分类号 G02B5/20
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