| 摘要 |
PURPOSE:To provide an exposure system with which a complicated IC pattern can be exposed on a wafer 18 by high resolving power. CONSTITUTION:An IC pattern is divided into a plurality of patterns, a plural number of mask patterns 15a and 15b, corresponding to the respective patterns, are arranged, the phase of light passed through the plural patterns 15a and 15b is shifted, the lights having shifted phase are combined, and the combined light is used for exposure. |
