发明名称 Cathode for vapour deposition coating of a substrate
摘要 Cathode is for vapour deposition coating of a substrate (46), connected to a DC and/or AC hf source and mounted in a vacuum chamber and in electrical connection with a target (29), which is vaporised and its particles deposited on the substrate. The cathode comprises a cylindrical container (3) with closed bottom (58) to which the target (29) is fixed, pref. screwed, on the outside and inserted at the other open end through a sealed opening (48) in the vacuum chamber (2), so that the interior space of the container is always subjected to atmospheric pressure and the outside of the container to the pressure conditions within vacuum chamber (2). A lockable insert (8) in the container forms a cylindrical space above the bottom plate (58), which houses a magnet set (5,4,61) with electromagnetic coil (61) and yoke (6).
申请公布号 DE4143135(A1) 申请公布日期 1993.07.29
申请号 DE19914143135 申请日期 1991.12.28
申请人 LEYBOLD AG, 6450 HANAU, DE 发明人 WOLF, BERND, 6450 HANAU, DE;MUELLER, JUERGEN, DR., 6000 FRANKFURT, DE;NEUDERT, HANS, 6463 FREIGERICHT, DE
分类号 C23C14/34;H01J37/34 主分类号 C23C14/34
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