| 发明名称 |
Methods and Apparatuses for Depositing Uniform Layers |
| 摘要 |
An apparatus including a process chamber and a gas flow control system for depositing layers having uniform properties on substrates.
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| 申请公布号 |
US2008092812(A1) |
申请公布日期 |
2008.04.24 |
| 申请号 |
US20050628925 |
申请日期 |
2005.06.10 |
| 申请人 |
MCDIARMID JAMES;COLVIN RONALD L;ROSE JOHN W;SAMUELS EARL B |
发明人 |
MCDIARMID JAMES;COLVIN RONALD L.;ROSE JOHN W.;SAMUELS EARL B. |
| 分类号 |
C23C16/52;H01L21/00;H01L21/36;H01L23/24 |
主分类号 |
C23C16/52 |
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