发明名称 DILUTED GAS EXCIMER GROWING METHOD
摘要 PURPOSE:To grow excimer of dilute gas by a simple method in which a cluster of dilute gas is fed in a stable manner, normal discharge is generated in the space region where the cluster is present, and the cluster is excited. CONSTITUTION:A nozzle 3 consists of a throat part 7 and an aperture 8 which is opened in tapered form. A cluster of diluted gas is grown by jetting diluted gas at ultra high speed from a nozzle to the space region in the vicinity of the region in front of the nozzle, and the excimer of diluted gas is grown with the cluster in an excited state utilizing the discharge or microwave discharge between a pair of electrodes on both sides of the space region.
申请公布号 JPH05136508(A) 申请公布日期 1993.06.01
申请号 JP19910319725 申请日期 1991.11.08
申请人 SASAKI WATARU;KUROSAWA HIROSHI;USHIO INC 发明人 SASAKI WATARU;KUROSAWA HIROSHI
分类号 H01S3/038;H01S3/0979 主分类号 H01S3/038
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