发明名称 |
Crosslinkable aqueous developable photoresist compositions and method for use thereof. |
摘要 |
<p>High sensitivity, high contrast, heat-stable resist compositions for use in deep UV, i-line e-beam and x-ray lithography. These compositions comprise a film-forming polymer having aromatic rings activated for electrophilic substitution, an acid catalyzable crosslinking agent which forms a hydroxy-stabilized carbonium ion, and a photoacid generator. The compositions are aqueous base developable. <IMAGE></p> |
申请公布号 |
EP0543761(A1) |
申请公布日期 |
1993.05.26 |
申请号 |
EP19920480157 |
申请日期 |
1992.10.23 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
SACHDEV, HARBANS SINGH;CONLEY, WILLARD EARL;JAGANNATHAN, PREMLATHA;KATNANI, AHMAD DAUOD;WAI-LING KWONG, RANEE;LINEHAN, LEO LAWRENCE;MIURA, STEVE SEIICHI;SMITH, RANDOLPH JOSEPH |
分类号 |
G03F7/004;G03F7/038;G03F7/075;H01L21/027;H01L21/30 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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