发明名称 PRODUCTION OF FINE POINTS ON A SUBSTRATE
摘要 <p>A method of forming a fine point or spike or array of fine points or spikes on a substrate (5) in which an electron beam (6) is focussed onto the substrate (5) at each point that a fine point or spike is required. The substrate (5) is positioned within a low pressure atmosphere, the atmosphere containing a precursor of the material for example a hydrocarbon or organo-metallic gas which forms the fine point or spike. The focussed electron beam (6) causes the deposition of material onto the substrate (5) to form the fine point or spike. An array of such fine points or spikes can be used as a field-emitter cathode surface in vacuum electronics.</p>
申请公布号 WO1993005530(A1) 申请公布日期 1993.03.18
申请号 GB1992001596 申请日期 1992.09.01
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