发明名称 POSITIVE TYPE PHOTORESIST COMPOSITION
摘要 PURPOSE:To obtain a pattern having high sensitivity, and excellent resolution, developing property, heat resistance and resist shapes by incorporating a quinone diazide compd. and specified flavonoid or bio-flavonoid compd. CONSTITUTION:This resist compsn. contains an alkali-soluble resin, quinone diazide compd. and at least one compd. selected from flavonoid or bio-flavonoid compds. expressed by formulae I-IV. In formulae I-IV, X is -C(=O)- or -C(R4, R5)-, R1-R7 are s or different hydrogen atom, hydroxyl group or alkyl group, however, at least one of R1-R5 is hydroxyl group and one of R6 and R7 is hydroxyl group, (m) and (n) are integers 1-3 satisfying m+n<=6. The flavonoid or bio-flavonoid compds. expressed by formulae I-IV exist in natural matter or can be obtd. by hydrolysis of glycosides of these.
申请公布号 JPH0545869(A) 申请公布日期 1993.02.26
申请号 JP19910230790 申请日期 1991.08.19
申请人 FUJI PHOTO FILM CO LTD 发明人 KAWABE YASUMASA;TAN SHIRO;KOKUBO TADAYOSHI
分类号 G03F7/004;G03F7/022;H01L21/027 主分类号 G03F7/004
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