发明名称 Semiconductor device and process for producing same
摘要 A semiconductor device provided with a polycrystalline silicon resistor containing an impurity in a high concentration and having a resistance adjusted by a current conduction therethrough at a current density of a threshold value or more, which comprises: a polycrystalline silicon resistor containing a first impurity having a negative value of a temperature coefficient of resistance in a high impurity concentration region of said polycrystalline silicon resistor and a second impurity having a positive value of a temperature coefficient of resistance in a high impurity concentration region of the polycrystalline silicon resistor. A process for producing same is also disclosed.
申请公布号 US5187559(A) 申请公布日期 1993.02.16
申请号 US19910661240 申请日期 1991.02.27
申请人 NIPPONDENSO CO., LTD. 发明人 ISOBE, YOSHIHIKO;IIDA, MAKIO
分类号 H01L27/04;H01L21/02;H01L21/822;H01L27/06 主分类号 H01L27/04
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