| 摘要 |
PURPOSE:To improve analysis precision, by providing a carrier gas flow rate adjusting means, a plasma torch vertical position adjusting means, and a spectroscope emission slit width adjusting means. CONSTITUTION:Argon gas and ground gas forming plasma are supplied from the lower part to plasma torch 1 by fixed flow rates respectively. That is, carrier gas passes through flow meter 5 and is jetted into spray room 7 through flow rate adjusting stop 6. The CPU is a microcomputer and stores proper values of the carrier gas flou rate, the plasma torch vertical position and the slit width for respective elements; and when an element to be detected is designated, respective parameters for this element are read, and the adjusting mechanism of stop 6, width adjusting mechanism 15 of emission slit S2, and so on are driven, so that the optimum inspection for each element to be detected can be performed automatically with one operation. |
