发明名称 |
PROCESS AND DEVICE FOR THE CONTINUOUS TREATMENT OF SILICON |
摘要 |
The invention relates to a process for the continuous treatment of silicon in which a slag in a pivotable low-shaft furnace (1) with a discharge pipe (4) reaching the bottom of the furnace tank is taken to a temperature of 1450 to 1800.degree.C and this slag is used to melt solid silicon and/or liquid silicon is continuously refined and the liquid refined silicon is then sprayed with compressed air or nitrogen (7) and continuously conveyed into a transport crucible (11) by being poured into a stream of water (9) in the channel (8) via a dewatering filter (10) and thus obtained in granular form. The invention also relates to devices for implementing the process.
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申请公布号 |
CA2112746(A1) |
申请公布日期 |
1993.01.21 |
申请号 |
CA19922112746 |
申请日期 |
1992.06.26 |
申请人 |
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发明人 |
HUTZLER, KARL;KOCH, RUDOLF;MORE, ANTON |
分类号 |
C01B33/037;F27D3/14;(IPC1-7):C01B33/037;C01B33/02 |
主分类号 |
C01B33/037 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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