| 摘要 |
PURPOSE:To prevent a resist removing capability in a removal chamber from being reduced. CONSTITUTION:Sulfuric acid tanks 10 are provided in a removal chamber 2, warm water cleaning tanks 11 are provided in a cleaning chamber 3, an opening and closing shutter 1 is provided between the chambers 2 and 3, a semiconductor wafer transfer robot 4 is provided, an air introducing pipe 5 having a plurality of holes in its lower part is provided over the vicinity of the shutter 1 and an air feeding device 12 is connected to the pipe 5. |
