FORMATION OF COMPOSITE OXIDE SUPERCONDUCTING THIN FILM

摘要

PURPOSE:To allow the execution of a film forming process at a lower temp. by arranging an electrode between a substrate and a target and executing a laser vapor deposition treatment while impressing a bias voltage between this electrode and the target as another electrode. CONSTITUTION:The substrate 1, the target 3 and the electrode 5 formed with metallic meshes are placed in a vacuum chamber 6. The target 3 is irradiated via a condenser lens 8 with the laser beam generated by a laser generator 7. The electrode 5 is placed in the position enclosing the bloom generated from the target 3 toward the substrate 1. The cathode of a bias power source 5a is connected to the target 3 and the anode to the electrode 5. The superconduction critical temp. of the sample formed by the specific impressed voltage increases if the laser vapor deposition is executed by changing the impressed bias power voltage. The execution of the film forming process at the lower temp. is executed and the film having the excellent film characteristics and superconductive characteristics is formed.