METHOD OF PROCESSING DRY ETCHING,申请号JP19910132608-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	METHOD OF PROCESSING DRY ETCHING
摘要
申请公布号	JPH04357830(A)	申请公布日期	1992.12.10
申请号	JP19910132608	申请日期	1991.06.04
申请人	HITACHI LTD	发明人	FUKUYAMA RYOJI;KAKEHI YUTAKA;HAMAZAKI RYOJI
分类号	C23F4/00;H01L21/302;H01L21/3065	主分类号	C23F4/00
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Polished polyimide substrate

Element management system for managing line-powered network elements

Image processing method, image processing apparatus, and projector

Method and apparatus for separating lons from a fluid stream

Corticotropin releasing factor receptor 2 deficient mice and uses thereof

Method, system and computer readable medium for duplicate record detection

Non-inverting domino register

Structure and method of stacking multiple semiconductor substrates of a composite semiconductor device

MANAGEMENT AND CONTROL OF BUFFER IN CLIENT DEVICE

COMBINATION OF A GUARD BED AND A COPPER-CONTAINING CATALYST BED

CRUDE BIOLOGICAL DERIVATIVES COMPETENT FOR NUCLEIC ACID DETECTION

Single wafer method and apparatus for drying semiconductor substrates using an inert gas air-knife

Platen and manifold for polishing workpieces

Method and apparatus for controlling transitions between electronic program guide modes

Electrical connector box and assembly method thereof

Pyrrole compounds, polymers thereof and EL element using the same

PARCEL OR SERVICE DELIVERY WITH PARTIALLY SCHEDULED TIME WINDOWS

MODAFINIL POLYMORPHIC FORMS

LOW WORK FUNCTION METAL COMPLEXES AND USES THEREOF

HDV NUCLEIC ACID MOLECULES, FRAGMENTS AND APPLICATIONS THEREOF