TARGET FOR MAGNETRON SPUTTERING DEVICE,申请号JP19910126167-传众专利搜索

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发明名称	TARGET FOR MAGNETRON SPUTTERING DEVICE
摘要
申请公布号	JPH04354868(A)	申请公布日期	1992.12.09
申请号	JP19910126167	申请日期	1991.05.29
申请人	VACUUM METALLURGICAL CO LTD	发明人	NOZAWA YOSHIHARU;OBA AKIRA;HAYASHI CHIKARA
分类号	C23C14/35	主分类号	C23C14/35
代理机构		代理人
主权项
地址

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