INCLINED POLISHING METHOD FOR SEMICONDUCTOR SAMPLES,申请号JP19910149458-传众专利搜索

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发明名称	INCLINED POLISHING METHOD FOR SEMICONDUCTOR SAMPLES
摘要
申请公布号	JPH04348028(A)	申请公布日期	1992.12.03
申请号	JP19910149458	申请日期	1991.05.24
申请人	KYUSHU ELECTRON METAL CO LTD;OSAKA TITANIUM CO LTD	发明人	EGUCHI HIROMICHI
分类号	H01L21/304;H01L21/66	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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