| 摘要 |
PURPOSE:To increase the contrast of patterns down to the inside of film thickness. CONSTITUTION:At least one materials among materials, such as solvent, photosensitive agent and additives incorporated into the resist film applied on a substrate 1 to be worked are graded in concn. in the thickness direction of the resist film and thereafter, the resist film is exposed and developed, by which the spread quantity of the patterns anticipated from the latent image generated in the resist film by the exposing and the concn. gradient are offset and the highcontrast patterns are formed. |
