PRODUCTION OF ELECTROOPTICAL DEVICE

摘要

PURPOSE:To minimize the damages to films and to prevent the deterioration of the electrooptical device as well as to improve the mass productivity thereof by minimizing the flow of a high-frequency current to a substrate. CONSTITUTION:The thin films consisting of amorphous Si contg. substantially no hydrogen as a base are deposited on a substrate 12 by a double-surface passage type high-frequency sputtering device which insulates the substrate 12 from a vacuum chamber and sputtering electrodes and varies the phases of the high frequencies supplied to both-surface high-frequency sputtering electrodes by about 180 deg. from each other.