SEMICONDUCTOR DEVICE AND ALIGNMENT METHOD

摘要

PURPOSE:To provide a semiconductor device which easily prevents dust from being generated due to release of an etching residue which remains on a side wall of a positioning mark without any reduction in detection sensitivity for the semiconductor device which is provided with the alignment mark for alignment at the time of patterning. CONSTITUTION:An alignment mark consisting of opposing region layers 17a and 17b which oppose each other and a band-shaped region layer 16a which is sandwiched by the opposing region layers 17a and 17b and generates a reflection light with a light intensity which is larger than that from the above opposing regions 17a and 17b for irradiation of a position detection light is provided on a surface layer of a semiconductor substrate 16.