发明名称 APPARATUS FOR INSPECTING FOREIGN MATTER
摘要 <p>PURPOSE:To certainly discriminate a pattern by setting the optimum polarization angle even when the polarization angle of scattering light is changed by the effect of a pattern shape. CONSTITUTION:When holizontal polarized laser L0 is emitted in the direction shown by an arrow, scattering beam L2 wherein both horizontal and vertical polarized beams are mixed is generated from foreign matter 2 and scattering light L1 mainly composed of vertical polarized beam is generated from a pattern 1. Both scattering beams are passed through polarizing filters 3a, 3b to be detected by detectors 4a, 4b and the foreign matter 2 or the pattern 1 is discriminated on the basis of the detection signals l1, l2 from the detectors by a pattern discrimination circuit 5 and only the signal from the foreign matter 2 is outputted and the size of the foreign matter is operated by an operational processing part 6. By this method, a pattern can be certainly discriminated.</p>
申请公布号 JPH04286942(A) 申请公布日期 1992.10.12
申请号 JP19910051091 申请日期 1991.03.15
申请人 HITACHI LTD 发明人 ONOSE MINORU;NISHINO TADASHI
分类号 G01B11/24;G01B11/245;G01N21/88;G01N21/94;G01N21/956;G03F1/84;H01L21/027 主分类号 G01B11/24
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