| 摘要 |
A delay device or detonator contains a delay composition comprising a consolidated, particulate mixture of silicon and a suitable oxidant, and a minor effective proportion of dispersed metal compound intimately incorporated therewith to serve as a reaction facilitating flux, and the metal compound may be selected from alkali metal salts such as sodium chloride, sodium sulphate, potassium sulphate; lead monoxide, oxides of antimony such as Sb2O3, or Sb2O5, vanadium e.g. V2O5 or mixtures thereof.
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