发明名称 DEVICE AND METHOD FOR PHOTOMASK DEFECT INSPECTION
摘要 <p>PURPOSE:To easily discriminate between a pattern defect and a particle by providing a compressed gas blowout nozzle which faces an inspected surface. CONSTITUTION:The compressed gas blowout nozzle 12 which faces the inspected surface is provided. Then a Y stage 9 is fed by a constant quantity repeatedly each time an X stage 8 is placed in scanning motion once, and compressed air 14 is blown to a photomask at the same time to automatically detect a defect of the photomask 1 over the entire surface of an inspection area while particles on the photomask 1 are removed. If a particle is detected, the defect is removed under the pressure of the compressed air, but the pattern defect is not removed, thereby discriminating between the particle and pattern defect. Thus, while the sticking particle is removed, the defect inspection is performed.</p>
申请公布号 JPH04151153(A) 申请公布日期 1992.05.25
申请号 JP19900275568 申请日期 1990.10.15
申请人 SEIKO EPSON CORP 发明人 IWAI KAZUO
分类号 G03F1/84;H01L21/66 主分类号 G03F1/84
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