发明名称 CLEANING APPARATUS FOR WAFER CARRIER
摘要 <p>PURPOSE:To maintain an electrification-preventing effect and to enable cleaning operation by a method wherein, when a wafer carrier is dried, its heating temperature and its heating time are controlled while the electrification voltage of the wafer carrier is being monitored. CONSTITUTION:A wafer carrier 4 is inserted into a shroud 10a; it is placed on a pedestal 6 as an insulator; it is dried by heating the clean air passed through a filter 10 by using an infrared lamp 9. A temperature is measured by using a temperature sensor 8 and the radiant energy of the infrared lamp is controlled by using a temperature and heating-time control part 12 so that a temperature at which the wafer carrier main body made of polypropyrene is not deformed can be maintained. At the same time, the voltage of an electric charge electrified at the wafer carrier is measured by using a voltage measuring probe 7, and the conductivity restoration degree of the wafer carrier is checked. Thereby, while an electrification-preventing effect is being maintained, a cleaning operation can be executed.</p>
申请公布号 JPH04142058(A) 申请公布日期 1992.05.15
申请号 JP19900264207 申请日期 1990.10.02
申请人 NEC YAMAGATA LTD 发明人 SASAKI KUNIO
分类号 H01L21/673;B08B3/10;H01L21/304;H01L21/68 主分类号 H01L21/673
代理机构 代理人
主权项
地址