VACUUM TREATMENT APPARATUS

摘要

PURPOSE:To efficiently perform dry cleaning and to eliminate the contamination of a product due to the generation of dust or residual gas by providing a means feeding a dummy substrate between a dummy substrate receiving means and a vacuum treatment chamber. CONSTITUTION:Vacuum treatment chambers 11a-11c treating substrates 20 to be treated under vacuum and internally subjected to dry cleaning treatment are provided. The dummy substrate 30 used in the dry cleaning treatment of the aforementioned vacuum treatment chambers is received in a cassette 1c arranged in the atmosphere Further, the dummy substrate 30 is fed between the cassette 1c and the vacuum treatment chambers. As a result, dry cleaning can be effectively carried out and the contamination of a product due to the generation of dust or residual gas is eliminated and high production efficiency and high product yeild can be realized.