发明名称 METHOD FOR SUBSIDING OF VACCUM DEPOSIT SILVERHALODE LAYERS
摘要 The method is used for microphotographic purposes, as well as for preparing media for digital laser recording. Layers with fine-grained texture are obtained, which result in improving the contrast, the resolution and the sharpness of the image. Maximum resolution of 1600 - 3300 lines/mm is typically achieved for the dotted layers. The method involves dotting vacuum-cladded silver-halogenide layers with metals of IV a and IV b groups of the periodic system and/or their oxides, and/or sulphides, and/or selenides, and/or tellurides at the rate of 1.10<-6> to 1.10<-2> percent (w/w) when dotting inside the layer and 7.10<-13> to 1.10<-6> percent (w/w) when dotting the layer surface. Arsenic and germanium, as well as oxides and halogenides thereof, have been tested in particular.
申请公布号 BG49912(A1) 申请公布日期 1992.03.16
申请号 BG19890088396 申请日期 1989.05.10
申请人 TSENTRALNA LABORATORIJA PO FOTOPROTSESI 发明人 ASSA, JAKOB J.;ENEVA, JANKA B.;PLATIKANOVA, VESELINA N.
分类号 C23C14/06;G01D15/34;G03C1/498;G11B7/24;(IPC1-7):G03C1/498 主分类号 C23C14/06
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