| 摘要 |
PURPOSE:To provide a recording element, to which a pattern is formed by lithography, having a simple structure and heat stability by irradiating a membrane of a high-molecular compound capable of being converted to a high- molecular compound mainly having a conjugated bond in its backbone by heat treatment with light or radiation before heat-treating the same. CONSTITUTION:A membrane of a high-molecular compound capable of being converted to a high-molecular compound mainly having a conjugated bond in its backbone by heat-treatment is irradiated with light or radiation and subsequently heat-treated and further pref. treated with a solvent. As the high- molecular compound capable of being converted to the high-molecular compound mainly having the conjugated bond in its backbone by heat treatment, poly (1,4-xylenedimethylsufonium chloride), poly[2.5-thienylenebis (methylenedimethylsulfonium bromide) and one wherein various substituents are provided to the aromatic ring of each of them are pref. Heat treatment temp. is usually room temp. - 4000 deg.C, pref., 100 - 3500 deg.C. By carrying out heat treatment, only the irradiated part becomes solvent-soluble and a pattern is formed by developing the membrane using the solvent. |
