| 摘要 |
PURPOSE:To contrive ravelling out of deviation of retaining position of a wafer mounting part against the scanning table for retention of mask by a method wherein a protruding part is provided on either of a horizontal direction displacement part and the wafer-mounting part, a recessed part is provided on the other part, and the protruding part and the recessed part are engaged with each other. CONSTITUTION:A protruding part 20 is provided on either of a horizontal direction displacement part 16' and a wafer mounting part 18, and a recessed part 22 is provided on the other part. The above-mentioned protruding part 20 and the recessed part 22 are engaged in such a manner that the horizontal direction displacement part 16' and the wafer mounting part 18' always form the prescribed relative positional relation when the wafer mounting part 18' is closely fitted to the vacuum suction maintaining surface 16d' of the horizontal direction displacement part 16'. As a result, the positional deviation, generating when the wafer mounting part 18' returns to the side of the horizontal direction displacement part 16' after the wafer mounting part 18 ' has been shifted to a mask retaining scanning table 14 from the side of the horizontal direction displacement part 16, can be prevented, and an exposing operation can be conducted in a stable manner for a long period of time. |
