| 摘要 |
<p>A reticle for projecting a fine pattern on an object surface comprises:- a transparent substrate; a first-type phase-shifter selectively patterned and deposited on the substrate producing a phase difference between light passing therethrough and light passing through other areas without phase-shifters; and a second-type phase-shifter selectively patterned and forming a groove in the substrate producing a phase difference between light passing therethrough and light passing through other areas without phase-shifters. The reticle may include a patterned shield layer which blocks transmission of light, and the phase difference of the first and second-type phase shifters is typically selected to be substantially equal to a half-wavelength of light used in photolithography. Another type of reticle comprises:- a transparent substrate; a phase-shifter formed by a first groove; and another phase-shifter formed by a second, deeper groove formed in the first groove. <IMAGE></p> |
