| 摘要 |
PURPOSE:To obtain a parallelization device for a mask aligner for gaining the parallelization of a sample and a mask by a surface contact of the surface of the sample and the mask by correcting a parallelization error between the sample and the mask by the surface contact of a sample stage being held on an outer frame or a mask holder and the mask holder or the sample stage. CONSTITUTION:To make a parallelization of a sample S and a mask using this parallelization device, a mask holder 3 located above is brought down toward the sample S which is correctly aligned on the surface of a sample stage 2 to bring the mask into contact with the sample S. When the mask is brought into close contact with the sample S by pressure, the sample S moves after the movement of the mask so that the sample S may contact the mask gradually by the surface, being followed by a change in position of a flexible plate 6. By this method, a parallelization of the sample and the mask is available and the sample and the mask get into a good condition for a contact exposure. This device makes an easy parallelization possible. Since a thickness error (degree of parallelization) between the sample and the mask is below 25mum and the sample moves just a little bit for the parallelization, the device is also usable for a hard contact in which the sample and the mask are brought into contact with each other by the pressure of 3-4kg/cm<2> or around by adjusting the thickness or width of the flexible plate 6. |
