发明名称 WAFER PHOTOMECHANICAL PROCESSOR AND PHOTOMECHANICAL PROCESS
摘要 <p>PURPOSE:To enable improving the operating efficiency of a photomechanical processor by registering the number of a mask being handled by the photomechanical processor in a controller, by reading the identification numbers of a plurality of cassettes, by seeking a photomechanical processor equipped with masks corresponding to the cassettes and by transferring and inputting the cassettes to the photomechanical processor to process wafers. CONSTITUTION:A plurality of cassettes 2 holding wafers 1 are carried to an identification number reader 20; the cassettes 2, of which identification numbers 2a are read by the number reader 20, are temporarily stored by a storage box 4 on the basis of the command of a controller 26; a photomechanical processor 21, with which masks 6 corresponding to the read identification numbers 2a are registered, is sought by the controller 26; and corresponding cassettes 2 are taken out from the storage box 4 and transferred and inputted by the command of the controller 26. The photomechanical processor 21 receiving the cassettes 2 applies resist by a resist applicator 9 and confirms the wafer number by a wafer number reader 24. The mask number is read by a mask reader 23, exposed by a light filter 8 and developed by a processor 10.</p>
申请公布号 JPH03289120(A) 申请公布日期 1991.12.19
申请号 JP19900092492 申请日期 1990.04.05
申请人 MITSUBISHI ELECTRIC CORP 发明人 WATANABE HIROSHI;KATO YUICHI
分类号 G03F1/00;G03F1/68;G03F7/20;H01L21/027;H01L21/30;H01L21/677 主分类号 G03F1/00
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