发明名称 Apparatus for treating a photosensitive material and method of adding water for use in the same.
摘要 <p>According to the present invention, there is disclosed an apparatus for treating a photosensitive material comprising a treating solution tank storing a treating solution for treating the photosensitive material, a replenishing unit for replenishing the solution into the treating solution tank and a water adding unit for adding water into the treating solution tank, in which an overflow sensor is provided to sense an overflow of the treating solution out of the treating solution tank based on the difference in the thermal conductivity of the surrounding environment as observed while the overflow is taking place and while the same is not taking place, and a predetermined amount of the solution s intermittently added by a constant amount to evaluate an entire amount of the solution replenished until it overflows out of the treating solution tank so that a corresponding amount of water may be added by the water adding unit. Therefore, the actual evaporation loss may precisely be compensated with water. &lt;IMAGE&gt;</p>
申请公布号 EP0456167(A2) 申请公布日期 1991.11.13
申请号 EP19910107334 申请日期 1991.05.06
申请人 FUJI PHOTO FILM CO., LTD. 发明人 MOGI, FUMIO
分类号 G03D3/00;G03D3/06 主分类号 G03D3/00
代理机构 代理人
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