发明名称 Apparatus for and method of projecting a mask pattern on a substrate.
摘要 <p>A lithographic projection apparatus is described which comprises an alignment device (AS1, AS2), a focusing device (FD), a substrate table positioning device (IF), as well as a projection image detection device (IS). The different devices are coupled together via a reference plate (RP) with which all devices cooperate. The image detection device which is implemented in a special manner can simultaneously process the information of different grating marks (P3, P4, P5) in the reference plate, while measurements can be carried out rapidly and accurately and an optimum image quality can be obtained. <IMAGE></p>
申请公布号 EP0445871(A1) 申请公布日期 1991.09.11
申请号 EP19910200434 申请日期 1991.03.01
申请人 ASM LITHOGRAPHY B.V. 发明人 WITTEKOEK, STEFAN;VAN DEN BRINK, MARINUS AART;FAHNER, THEODORUS AART
分类号 G03F7/207;G03F7/20;G03F9/00;H01L21/027;H01L21/30 主分类号 G03F7/207
代理机构 代理人
主权项
地址