| 摘要 |
PURPOSE:To improve the brush resistance of a press plate by applying and drying a solution or dispersion medium of a non-silver sensitive compound which contains an electron-beam setting compound on a base, performing image exposure and development, and then irradiating the compound with an electron beam. CONSTITUTION:At least one kind of non-silver sensitive compound coat liquid containing the electron-beam setting compound is supplied to a coating head 1 by one of quantitative liquid feed pumps P1-P3, etc., and applied over a web 3 which runs continuously at an extrusion bead part 2. A pressure reduction chamber 4 is provided so as to stabilize the bead. The web 3 applied with the coat liquid is sent to a drying device 10 and dried. The obtained photosensitive lithographic press plate is exposed to an image and developed, and then irradiated with the electron beam. The electron-beam setting compound is polymerized by the electron beam irradiation to manufacture the press plate with superior brush resistance. |
