发明名称 THREE DIMENSIONAL PLATING OR ETCHING PROCESS AND MASKS THEREFOR
摘要 <p>.n a process for plating or etching metalization patterns on the surface of a three dimensional substrate, a flexible plastic mask is fabricated by first coating the surface of a thin plastic sheet with vacuum formable ink. The mask is then molded into the shape of the surface into which the pattern is to be formed. A low power YAG laser is used to remove areas of the ink through which light is to be allowed to pass. This mask may then be used in either a print and plate process or a print and etch process by drawing the mask into intimate contact with the workpiece by applying a vacuum between the mask and the workpiece. The workpiece may then be exposed to light through the clear areas of the mask.</p>
申请公布号 WO1991013384(A1) 申请公布日期 1991.09.05
申请号 US1991001209 申请日期 1991.02.21
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