发明名称 |
Method of stripping layers of organic materials |
摘要 |
Gaseous sulfur trioxide is used to remove various organic coatings, polymerized photoresist, and especially implant and deep-UV hardened photoresist layers, during the manufacture of semiconductor or ceramic devices.
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申请公布号 |
US5037506(A) |
申请公布日期 |
1991.08.06 |
申请号 |
US19900579064 |
申请日期 |
1990.09.06 |
申请人 |
GUPTA, SUBHASH;SINGH, BHANWAR;WALEH, AHMAD |
发明人 |
GUPTA, SUBHASH;SINGH, BHANWAR;WALEH, AHMAD |
分类号 |
G03F7/42;H01L21/306;H01L21/311;H05K3/26 |
主分类号 |
G03F7/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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