| 摘要 |
An optical system for X rays having a multilayer reflecting mirror which has high reflectances for X rays of different wavelengths. One type of multilayer reflecting mirror is such that the mirror surface of the multilayer reflecting mirror is divided into a plurality of regions, and the regions are provided with multilayers which are such that the reflectance of each multilayer is maximum for X rays of a corresponding wavelength. Another type of multilayer reflecting mirror has a substrate and a plurality of multilayer laid on the substrate, wherein the wavelength of X rays to be reflected with a maximum reflectance varies from multilayer to multilayer. The optical system for X rays according to the present invention is a focusing optical system having a plurality of such multilayer reflecting mirrors and can obtain object images by using X rays of a plurality of wavelengths.
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