| 摘要 |
PURPOSE:To improve throughput capacity by calculating a plurality of rotation slippage values and performing a weighed operation of the above rotation slippage values when the amount of rotation slippage between a mask and a wafer is calculated. CONSTITUTION:A plurality of rotation slippage values are calculated on the basis of a plurality of combination kinds of measurement information which are obtained by a mark measuring means for relative amount of slippage between a mask and a wafer. The amount of corrective driving so as to put a substrate on top of an original plate can be obtained further with high accuracy by performing a weighted operation or by selecting the rotation slippage values according to the accuracy of the measurement information. Since rotation slippage is selected according to the accuracy of measurement information, sufficiently, highly accurate rotation slippage values that are calculated on the basis of measurement information in a linear region are obtained, even though either of marks enters in a nonlinear region. In this way, the number of steps is reduced without making each measurement region narrow and throughput capacity is increased. |
