| 摘要 |
PURPOSE:To prevent the internal sticking of vapor and to perform stable vapor deposition, by heating and evaporating >=2 kinds of materials to be evaporated in a vapor source with respective heat sources and controlling the temp. of the material to be evaporated which is lower in the rate of evaporation thereby controlling the temp. over the entire part. CONSTITUTION:The vessel body 10 of an evaporation source 11 is partitioned to spaces 2a, 2b by a partition wall 2 and the 1st and the 2nd Se-Te materials 3, 4 to be evaporated having respectively different concns. are stored in vessels 13, 14 and are heated and evaporated with heater lamps 5, 6. The vapors are conducted through an upper opening 7 smaller than the evaporation area thereof toward a substrate to be deposited therein with a film by evaporation (not shown). Plates 15, 16 for preventing bumping and heater lamps 17, 18 for accelerating the vapors and preventing condensation are preferably provided in the respective spaces 2a, 2b. The temp. of the 2nd material 4 which is lower in the rate of evaporation of the above-mentioned materials to be evaporated is detected with a thermocouple 19, and the lamps 5, 6 are controlled by a detection part 20 and a control circuit 21, whereby the temp. over the entire part of the source 11 is controlled constant. |
