发明名称 POSITIVE TYPE PHOTORESIST COMPOSITION
摘要 PURPOSE:To obtain the resin which is large in the change of a developing speed with respect to a change of an exposure and forms sharp patterns by incorporating a polyvalent phenol compd. obtd. by condensing a specific phenol compd. and specific hydroxy arom. aldehyde and a photosensitive agent into the above compsn. CONSTITUTION:The polyvalent phenol compd. obtd. by condensing the phenol compd. expressed by formula I and the hydroxy arom. aldehyde expressed by formula II and the photosensitive agent are incorporated into the compsn. In the formulas I and II, R<1> denotes 1 to 9C alkyl group or halogen atom; p denotes 0, 1 or 2; R<2> denotes a -OCH3 group, 1 to 9C alkyl group, halogen atom or nitro group, q is 0 or 1. The compd. is obtd. by bringing phenols for 1 to 8 hours at 50 to 180 deg.C at 0.8 to 50mol per 1mol aldehyde in the presence of an acidic catalyst. The change of the developing speed with respect to the change of the exposure is increased in this way and the sharp patterns are formed.
申请公布号 JPH02300751(A) 申请公布日期 1990.12.12
申请号 JP19890121729 申请日期 1989.05.16
申请人 MITSUBISHI PETROCHEM CO LTD 发明人 NAKANO YOSHITOMO;KADA MASUMI;ITO SATOSHI
分类号 G03F7/023;H01L21/027 主分类号 G03F7/023
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