| 摘要 |
<p>PURPOSE:To obtain strong sucking force and to prevent dusts from adhering to the surface of a substrate by providing a plurality of suction gas diffusers obliquely radially extending toward the substrate provided at the center of the suction surface, a tapered part with a plurality of diffuser forming faces as a top, and a plurality of protrusions on the peripheral edge of the suction surface. CONSTITUTION:A plurality of gas diffusers 1a opened obliquely downward to be radially extended are provided. In order to easily feed gas flow 3 diffused from the diffusers 3a, a tapered part 7 with a plurality of gas diffuser forming faces as a top is provided, and substrate guides 2a protrude at several positions. Thus, the area of a negative pressure part 4 is increased to strength suction force for a semiconductor substrate 5. Since the part 7 is provided and the several guides 2a protrude, gas flow can be externally escaped. Thus, dusts are not filled in an suction device, and not adhered to the substrate.</p> |
