| 摘要 |
PURPOSE:To eliminate a partial thermal-distortion of a mask and to make a practical use of an X-ray exposure apparatus to be easy by providing a cylin drical mirror to diffuse an X-ray from its source and to irradiate an exposure surface. CONSTITUTION:An X-ray exposure apparatus is an apparatus which has a cylindrical mirror 2 to diffuse an X-ray from a source 1 and to irradiate it onto an exposure surface, and a curvature radius R of the mirror 2 is set so as to satisfy an quation I. In this case, when the R stays within an aforementioned range in a relationship between an exposure area and an exposure strength of the X-ray, by usage of the cylindrical mirrors 2 having the Rs of 250m, 100m and 45.5m, respectively, an unevenness of exposure stays within a permissible range (an exposure amount at an edge area in no less than one half of the amount at a central area). Also, a ratio of a light amount to be used, to whole light amount, may not become too small. |
