| 摘要 |
PURPOSE:To improve ionization efficiency and coating yield, by disposing filaments for generation of thermoelectrons near a substrate whcih is at a negative potential with respoect to an evaporating source, and disposing plate-like anodes which are at a positive potential with said filaments and the substrate behind the filaments with the plate surfaces directed toward the substrate side. CONSTITUTION:An ion plating device has filaments 12 for generation of thermoelectrons near a substrate 4 which is at a negative potential with respect to an evaporating source 3. Plate-like anodes 13 which are at a positive potential with respoct to the filaments 12 and the substrate 4 are disposed behind the filaments 12 with the plate surfaces directed toward the substrate 4 side. Since the anodes 16 are disposed above the source 3 in such a way, the ionization efficiency is improved and the anodes 13 function as the 2nd evaporating source, thus improving the coating yield. |
